Volume no :16, Issue no: 1, September (2022)

International Journal of Applied Mathematics and Machine Learning

ON PROGNOSIS OF MANUFACTURING OF AN AMPLIFIER FRAMEWORK A HETEROSTRUCTURES. AN APPROACH TO OPTIMIZE MANUFACTURING TO INCREASE DENSITY OF THEIR ELEMENTS WITH ACCOUNT MISSMATCH INDUCED STRESS

Author's: E. L. Pankratov
Pages: [1] - [49]
Received Date: October 20, 2021; Revised November 9, 2021
Submitted by: Professor Jianqiang Gao
DOI: http://dx.doi.org/10.18642/ijamml_7100122239

Abstract

In this paper we introduce an approach to increase density of field-effect transistors framework nulling-resistor output amplifier. Framework the approach we consider manufacturing the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.

Keywords

nulling-resistor output amplifier, optimization of manufacturing, analytical approach for modelling.