Journal of Materials Science and Engineering with Advanced TechnologyAuthor's: Chaofeng Gao, Quan Meng and Chunhui Shen
Pages: [69] - [87]
Received Date: October 30, 2017
Submitted by:
DOI: http://dx.doi.org/10.18642/jmseat_7100121898
Novel UV-curable/alkali-soluble resins, named as PA/HEA, BA/HEA, MA/HEA, and HHPA/HEA, were prepared by esterification between 2-hydroxyethylacrylate (HEA) and different acid anhydrides respectively, e.g., phthalic anhydride (PA), succinic anhydride (BA), maleic anhydride (MA), and hexahydrophthalic anhydride (HHPA). The esterification conditions were calculated using the titration of the acid value and the FT-IR. Negative photoresists were prepared by blending AHEA with composite photoinitiators, while the optimal ratio of composite photoinitiators was determined by ultraviolet absorption spectra. The UV-curing process was investigated by FT-IR. It was found that the conversion of double bonds can reach 94.47% after exposure for 24s. The effect of photoinitiator on oxygen inhibition (OI) was investigated by ATR-FTIR. The results demonstrated that increasing photoinitiator concentration can produce higher OI resistance. The cured (AHEA) films showed good thermal stability under 150°C. The PA/HEA and HHPA/HEA films could resist 10wt% hydrochloric acid for at least 30min but could be stripped in 1wt% NaOH aqueous solution.
UV-curable, alkali-soluble, negative photoresist, photosensitive properties.
